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High Quality Non-Transfer Single-Layer Graphene Process Grown Directly on Ti(10 nm)-Buffered Layer for Photo Lithography Process

Journal of The Korean Institute of Electrical and Electronic Material Engineers Pub Date : 2021-01-01 DOI:10.4313/JKEM.2021.34.1.21
O. Ryong, Yire-Han, Eom Jiho, Soon-Gil Yoon
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在Ti(10nm)缓冲层上直接生长的高质量非转移单层石墨烯工艺-用于光刻工艺
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Journal of The Korean Institute of Electrical and Electronic Material Engineers
Journal of The Korean Institute of Electrical and Electronic Material Engineers
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