Effects of Nitrogen Content on the Structural, Mechanical, and Corrosion Properties of ZrN Thin Films Grown on AISI 316L by Radiofrequency Magnetron Sputtering

IF 1.5 4区 材料科学 Q3 CRYSTALLOGRAPHY
M. Azibi, N. Saoula, N. Madaoui, H. Aknouche
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引用次数: 2

Abstract

Zirconium nitride films are deposited onto stainless steel AISI 316L and silicon (100) by radio frequency magnetron sputtering at different nitrogen flow ratios [N2/(Ar+N2)] varied between 0 and 0.25). Scanning electron microscope, atomic force microscopy, X‐ray diffraction (XRD), and Raman are used to investigate the surface morphology and microstructure of the thin films. The mechanical and electrochemical properties of all coatings are evaluated and compared with the uncoated AISI 316L to explore the efficiency of surface modification. The XRD and Raman analysis show that all the films are crystalline. This shows that the increased nitrogen content leads to a transformation from hexagonal α‐Zr phase to cubic c‐Zr and then to mixed α‐Zr and face centered cubic c‐ZrN phases. The films deposited with nitrogen flow ratio of 0.2 show the highest hardness of 32.2 GPa. Using the potentiodynamic polarization method, the corrosion behavior of the films is studied in Hank's solution. The comparison between uncoated and coated substrates shows a decrease in corrosion current density for all coated samples.
氮含量对在aisi316l上射频磁控溅射生长ZrN薄膜结构、力学和腐蚀性能的影响
采用射频磁控溅射技术,在不同氮流比[N2/(Ar+N2)](0 ~ 0.25)下,在不锈钢AISI 316L和硅(100)表面沉积氮化锆薄膜。利用扫描电子显微镜、原子力显微镜、X射线衍射(XRD)和拉曼光谱对薄膜的表面形貌和微观结构进行了研究。评价了所有涂层的力学和电化学性能,并与未涂层的AISI 316L进行了比较,以探讨表面改性的效率。XRD和拉曼光谱分析表明,所有薄膜均为结晶。结果表明,氮含量的增加导致六方相α - Zr转变为立方相c - Zr,然后转变为α - Zr和面心立方相c - ZrN。氮流比为0.2时沉积的薄膜硬度最高,达到32.2 GPa。采用动电位极化法研究了膜在汉克溶液中的腐蚀行为。未涂覆和涂覆基材之间的比较表明,所有涂覆样品的腐蚀电流密度都有所下降。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
自引率
6.70%
发文量
121
审稿时长
1.9 months
期刊介绍: The journal Crystal Research and Technology is a pure online Journal (since 2012). Crystal Research and Technology is an international journal examining all aspects of research within experimental, industrial, and theoretical crystallography. The journal covers the relevant aspects of -crystal growth techniques and phenomena (including bulk growth, thin films) -modern crystalline materials (e.g. smart materials, nanocrystals, quasicrystals, liquid crystals) -industrial crystallisation -application of crystals in materials science, electronics, data storage, and optics -experimental, simulation and theoretical studies of the structural properties of crystals -crystallographic computing
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