Structural and corrosion behaviour of bilayer and alloyed films of Cu-Ni

K. Gobi Saravanan, R. Anatha Kumar, D. Ramachandran, T. Shyju, V. Vishwakarma, Sang-jae Kim, P. Kuppusami
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引用次数: 1

Abstract

Bilayer and alloyed thin films of Cu-Ni were successfully prepared by RF magnetron sputtering method. XRD analysis showed polycrystalline film with preferred orientation for both bilayer and alloyed thin films. Nanograins were observed by FESEM. The results of electrochemical experiments indicated that the alloyed films exhibited superior corrosion resistance followed by bilayer and bare 316L stainless steel in 3.5% NaCl solution.
Cu-Ni双层及合金膜的结构与腐蚀行为
采用射频磁控溅射法制备了Cu-Ni双层薄膜和合金薄膜。XRD分析表明,双分子层薄膜和合金薄膜均具有择优取向。用FESEM观察纳米颗粒。电化学实验结果表明,合金膜在3.5% NaCl溶液中表现出较好的耐蚀性,其次是双层和裸316L不锈钢。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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