Design and construction of a 2.45 GHz waveguide-based microwave plasma jet at atmospheric pressure for material processing

IF 3.1 3区 物理与天体物理 Q2 PHYSICS, APPLIED
A I Al-Shamma'a, S R Wylie, J Lucas, C F Pau
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Abstract

We have designed a low-cost and reliable 2.45 GHz waveguide-based applicator to generate a microwave plasma jet (MPJ) at atmospheric pressure. The MPJ system consists of a 1-6 kW magnetron power supply, a circulator, a water-cooled matched load and the applicator. The applicator includes a tuning section, which is required to reduce the reflected power, and the nozzle section. The plasma is formed by the interaction of the high electrical field, generated by the microwave power, between the waveguide aperture and the gas nozzle. A variety of gases have been used to produce the plasma including argon, helium and nitrogen. A 2 kW, 2.45 GHz MPJ, constructed using a rectangular waveguide WG9A (WR340), has been investigated. An MPJ has been used for material processing applications including cutting, welding, glass vitrification and quartz/ceramic processing. This paper discusses the design parameters and the potential of the MPJ for industrial applications and how the jet can be tailored to suit different tasks, by adjusting the various parameters such as the type of gas, the flow rate, the input power and the nozzle design.
基于2.45 GHz波导的常压微波等离子体射流的设计与构建
我们设计了一种低成本、可靠的基于2.45 GHz波导的应用器,用于在大气压下产生微波等离子体射流(MPJ)。MPJ系统由1- 6kw磁控管电源、循环器、水冷匹配负载和涂敷器组成。所述涂敷器包括减小反射功率所需的调谐部分和喷嘴部分。等离子体是由微波功率产生的高电场在波导孔径和气体喷嘴之间相互作用形成的。各种各样的气体被用来产生等离子体,包括氩、氦和氮。研究了一种使用矩形波导WG9A (WR340)构建的2kw, 2.45 GHz MPJ。MPJ已用于材料加工应用,包括切割,焊接,玻璃玻璃化和石英/陶瓷加工。本文讨论了MPJ的设计参数和工业应用潜力,以及如何通过调整各种参数(如气体类型、流量、输入功率和喷嘴设计)来定制射流以适应不同的任务。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Journal of Physics D: Applied Physics
Journal of Physics D: Applied Physics 物理-物理:应用
CiteScore
6.80
自引率
8.80%
发文量
835
审稿时长
2.1 months
期刊介绍: This journal is concerned with all aspects of applied physics research, from biophysics, magnetism, plasmas and semiconductors to the structure and properties of matter.
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