A Novel Radio-Frequency Inductively Coupled Plasma Torch for Material Processing

IF 2.6 3区物理与天体物理 Q3 ENGINEERING, CHEMICAL

Plasma Chemistry and Plasma Processing Pub Date : 2021-08-21 DOI:10.1007/s11090-021-10200-8

Patrick Mirek, Sina Alavi, Javad Mostaghimi

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引用次数: 2

Abstract

A novel radio frequency inductively coupled plasma (RF-ICP) torch has been designed for powder processing with a significant improvement in performance and throughput. The torch features a unique conical geometry which leads to reduced gas and power consumption. Computer simulations in ANSYS Fluent were conducted to model the injection of powder particles into the plasma discharge produced by the RF-ICP torch. The results were used to optimize the conical torch and compare its performance to a conventional RF-ICP torch. It was found that the new conical torch achieves particle spheroidization ratios up to 2 times higher than the conventional torch, due to higher temperatures and an induction zone closer to particles. Additionally, the torch runs at 42% lower gas consumption and can achieve industrially acceptable spheroidization ratios at half the power level of the conventional torch. The results were found to be in good agreement with previous works. This novel design has the potential to provide significant monetary savings and increased productivity to industries currently using RF torches, and potentially attract new industries which can benefit from this technology.

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一种新型材料加工用射频电感耦合等离子体炬

设计了一种新型的射频电感耦合等离子体(RF-ICP)火炬，用于粉末加工，在性能和吞吐量方面有了显着提高。火炬具有独特的圆锥形几何形状，可减少燃气和电力消耗。利用ANSYS Fluent软件对RF-ICP火炬产生的等离子体放电中粉末颗粒的注入过程进行了计算机模拟。利用实验结果对锥形火炬进行了优化，并与传统的RF-ICP火炬进行了性能比较。研究发现，由于温度更高，感应区更靠近颗粒，新型圆锥形火炬的颗粒球化率比传统火炬高2倍。此外，该火炬的气体消耗量降低了42%，并且可以在传统火炬一半的功率水平下实现工业上可接受的球化率。研究结果与前人的研究结果一致。这种新颖的设计有可能为目前使用RF火炬的行业节省大量资金并提高生产率，并有可能吸引可以从该技术中受益的新行业。

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来源期刊

Plasma Chemistry and Plasma Processing 工程技术-工程：化工

CiteScore

5.90

自引率

8.30%

发文量

审稿时长

6-12 weeks

期刊介绍： Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.