Hengyu Yu;Monikuntala Bhattacharya;Michael Jin;Limeng Shi;Shiva Houshmand;Atsushi Shimbori;Marvin H. White;Anant K. Agarwal
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引用次数: 0
Abstract
Developing an effective methodology to enhance the uniformity of short-circuit withstand time (SCWT) in silicon carbide (SiC) MOSFETs is crucial for ensuring device reliability and consistency in power electronic systems. This letter presents a detailed analysis of SCWT variations caused by inevitable process-induced deviations and introduces a new screening approach based on artificial neural network (ANN) technology. A two-hidden-layer ANN model is constructed using characteristic parameters extracted from SiC MOSFETs. The trained model accurately predicts the SCWT of TCAD-simulated SiC MOSFETs, achieving a maximum error of less than 15% and an average error of only 2%. This proposed method effectively identifies and removes devices with shorter SCWT without compromising the performance of reliable devices, thereby enhancing post-fabrication consistency for packaged devices.
期刊介绍:
IEEE Electron Device Letters publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors.