Dmitry Antonov , Emmanuil Silkis , Vladimir Kolotov
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引用次数: 0
Abstract
In present work, nine previously unknown S I emission lines were observed and described in ICP, helium and argon dc arc plasma. The observations were performed in 910–970 nm spectral range via high-sensitive Ebert fiber-optic spectrometer with linear CMOS array detector with resolution 0.06 nm. Measurements of wavelengths were performed with 0.003 nm accuracy. The wavelengths and relative intensities of all observed sulfur lines in this spectral region, including new ones, were presented in table. Sulfur spectra in dc arc plasma were found to exhibit significant wavelength shifts when compared to ICP ones. These shifts were measured and presented in table as well.
期刊介绍:
Spectrochimica Acta Part B: Atomic Spectroscopy, is intended for the rapid publication of both original work and reviews in the following fields:
Atomic Emission (AES), Atomic Absorption (AAS) and Atomic Fluorescence (AFS) spectroscopy;
Mass Spectrometry (MS) for inorganic analysis covering Spark Source (SS-MS), Inductively Coupled Plasma (ICP-MS), Glow Discharge (GD-MS), and Secondary Ion Mass Spectrometry (SIMS).
Laser induced atomic spectroscopy for inorganic analysis, including non-linear optical laser spectroscopy, covering Laser Enhanced Ionization (LEI), Laser Induced Fluorescence (LIF), Resonance Ionization Spectroscopy (RIS) and Resonance Ionization Mass Spectrometry (RIMS); Laser Induced Breakdown Spectroscopy (LIBS); Cavity Ringdown Spectroscopy (CRDS), Laser Ablation Inductively Coupled Plasma Atomic Emission Spectroscopy (LA-ICP-AES) and Laser Ablation Inductively Coupled Plasma Mass Spectrometry (LA-ICP-MS).
X-ray spectrometry, X-ray Optics and Microanalysis, including X-ray fluorescence spectrometry (XRF) and related techniques, in particular Total-reflection X-ray Fluorescence Spectrometry (TXRF), and Synchrotron Radiation-excited Total reflection XRF (SR-TXRF).
Manuscripts dealing with (i) fundamentals, (ii) methodology development, (iii)instrumentation, and (iv) applications, can be submitted for publication.