Radiation-Hardened Position-Sensitive Photodetector Based on Undoped 4H-SiC

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Miaomiao Yang, Haoran Mu, Yanxia Cui, Jiangwei Cui, Yuying Xi, Shaoding Liu, Ye Yuan, Yun Li, Yu Wang, Youchen Chen, Guohui Li, Shenghuang Lin
{"title":"Radiation-Hardened Position-Sensitive Photodetector Based on Undoped 4H-SiC","authors":"Miaomiao Yang, Haoran Mu, Yanxia Cui, Jiangwei Cui, Yuying Xi, Shaoding Liu, Ye Yuan, Yun Li, Yu Wang, Youchen Chen, Guohui Li, Shenghuang Lin","doi":"10.1021/acsami.4c21547","DOIUrl":null,"url":null,"abstract":"Position-sensitive photodetectors (PSDs) have been widely used for seamless, high-resolution light tracking, but applications such as aerospace and prolonged field operations require stable performance in extreme environments. Conventional PSDs, typically based on the lateral photovoltaic effect of silicon or other semiconductor junctions, are prone to radiation damage and material degradation, limiting their reliability under harsh conditions. Silicon carbide (SiC), with its wide bandgap, high mobility, low defect density, and strong resistance to radiation damage, offers a promising alternative for developing robust detectors. In this work, we present a PSD based on undoped 4H-SiC, designed with a simple vertical structure that eliminates the need for complex multi-interface architectures. The device demonstrates excellent performance, including a light on–off ratio exceeding 10<sup>3</sup> under sub-milliwatt illumination, spatial resolution of ∼0.1 μm, and fast response times of ∼10 μs (rise) and ∼6.3 μs (fall). It also exhibits remarkable stability under γ-ray irradiation (300 krad) with minimal photocurrent variation, making it suitable for accurate position tracking in radiation-prone environments. This work highlights the potential of 4H-SiC-based PSDs for advanced sensing applications that demand both high performance and resilience in extreme environments.","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":"40 1","pages":""},"PeriodicalIF":8.3000,"publicationDate":"2025-02-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Materials & Interfaces","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1021/acsami.4c21547","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

Abstract

Position-sensitive photodetectors (PSDs) have been widely used for seamless, high-resolution light tracking, but applications such as aerospace and prolonged field operations require stable performance in extreme environments. Conventional PSDs, typically based on the lateral photovoltaic effect of silicon or other semiconductor junctions, are prone to radiation damage and material degradation, limiting their reliability under harsh conditions. Silicon carbide (SiC), with its wide bandgap, high mobility, low defect density, and strong resistance to radiation damage, offers a promising alternative for developing robust detectors. In this work, we present a PSD based on undoped 4H-SiC, designed with a simple vertical structure that eliminates the need for complex multi-interface architectures. The device demonstrates excellent performance, including a light on–off ratio exceeding 103 under sub-milliwatt illumination, spatial resolution of ∼0.1 μm, and fast response times of ∼10 μs (rise) and ∼6.3 μs (fall). It also exhibits remarkable stability under γ-ray irradiation (300 krad) with minimal photocurrent variation, making it suitable for accurate position tracking in radiation-prone environments. This work highlights the potential of 4H-SiC-based PSDs for advanced sensing applications that demand both high performance and resilience in extreme environments.

Abstract Image

求助全文
约1分钟内获得全文 求助全文
来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信