Development of a high-intensity compact D-D neutron generator based on RF ion sources

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2024-11-30 DOI:10.1016/j.vacuum.2024.113909

Zhenqing Zhu , Yuzhong Qian , Mengmeng Li , Xin Tao , Bing Hong , Jichao Wang , Jiasheng Chen , Wei Xu , Xiancai Meng , Lizhen Liang , Chundong Hu

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引用次数: 0

Abstract

The present paper presents a compact D-D neutron generator designed for imaging applications, capable of producing a neutron yield exceeding 10⁹n/s. Here, a RF ion source ignited by an external antenna is envisaged, and the discharge chamber's design involves a double-layer glass cylinder for active cooling of the discharge chamber. At the same time, by improving the chamber's size and strategically positioning the magnetic field outside -multi-cusp and top magnetic field, the efficiency of the ion source is enhanced, including increased the extract beam current and extended ion source life, thus fostering increased neutron production and prolonged service duration. The experimental results show that under the condition of RF power 400 W and high voltage negative 95 kV, the beam current is extracted by 9.5 mA, and the stable operation of 24 h is realized, which the neutron yield reaches 1.1 × 10⁹ n/s with effective operation time surpassing 95 %.

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.