Wide-temperature-range tribological properties of Cu-Ni-Al films with multiple oxidation states

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2024-11-09 DOI:10.1016/j.vacuum.2024.113823

Ziluo Cheng , Xiao Wang , Xiaona Li , Zhumin Li , Yinglin Hu , Qiao Jiang , Renwei Liu , Yuandi Hou , Min Li , Rui Zheng , Chuang Dong

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引用次数: 0

Abstract

High-temperature (HT) apparatus suffer from galling and seizure of contact interface, for which a wear-resistant film is helpful but challenging to design. In this work, the Cu-Ni-Al films prepared by magnetron sputtering provide effective wear-resistant protection for Ni-based superalloy over room temperature (RT) to 800 °C, decreasing the coefficient of friction by 45 %, 30 %, 15 % and wear rate by 97 %, 65 %, 62 % at RT, 400 °C, 600 °C, respectively, and exhibiting especially low wear rate 1.88 × 10⁻⁵mm³N⁻¹m⁻¹ at 800 °C. Layered structure with multiple oxidation states formed during friction is the crucial, with the Cu₂O-rich layer and the CuO layer serving lubrication at RT and HT, respectively. The FCC + L1₂ structure ensures the high-temperature carrying capacity and film-substrate adhesion. AFM investigation exhibits the microscale tribological behavior is relevance with Ni + Al content. This work provides a novel strategy for the design and preparation of wide-temperature-range wear-resistant film.

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具有多种氧化态的铜-镍-铝薄膜的宽温度范围摩擦学特性

高温（HT）设备的接触界面会出现咬合和咬合现象，为此需要设计一种耐磨薄膜，但这种薄膜的设计具有挑战性。在这项工作中，通过磁控溅射制备的铜-镍-铝薄膜为镍基超合金提供了有效的耐磨保护，在室温（RT）至 800 °C 的条件下，摩擦系数分别降低了 45%、30%、15%，磨损率在室温、400 °C 和 600 °C 条件下分别降低了 97%、65%、62%，尤其是在 800 °C 条件下，磨损率低至 1.88 × 10-5mm3N-1m-1。摩擦过程中形成的多氧化态分层结构是关键所在，其中富含 Cu2O 的层和 CuO 层分别在 RT 和 HT 条件下起到润滑作用。FCC + L12 结构确保了高温承载能力和薄膜与基底的粘附性。原子力显微镜研究表明，微尺度摩擦学行为与 Ni + Al 含量相关。这项研究为设计和制备宽温范围耐磨薄膜提供了一种新策略。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.