Field ionization intensity used to measure local pressure in gas flows

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2024-10-18 DOI:10.1016/j.vacuum.2024.113728

Felix Sharipov , Irina Graur , Evelyne Salançon

引用次数: 0

Abstract

A coaxial ion source produces an ion beam via field effect in a gas flow through a coaxial microchannel structure. Measuring the intensity of ion emission under an electric voltage condition reveals the pressure at the tip of the coaxial structure, where ionization occurs. The spatial resolution of the measurements is defined by the volume into which the position of the tip fits, here estimated as a cube with an edge of 10

μ

m. The pressure at the tip is also obtained analytically as a function of the throughput through the coaxial structure. The theoretical and experimental pressure values reported in the present work are in agreement between them within the geometric uncertainties of the coaxial structure itself.

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用于测量气体流中局部压力的场电离强度

同轴离子源通过气体流经同轴微通道结构时的场效应产生离子束。在电压条件下测量离子发射的强度，可以显示发生电离的同轴结构顶端的压力。测量的空间分辨率由尖端位置所适合的体积决定，这里估计为边缘为 10 μm 的立方体。针尖处的压力也是通过分析获得的，是通过同轴结构的吞吐量的函数。在同轴结构本身的几何不确定性范围内，本研究中报告的理论和实验压力值是一致的。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.