A 220 GHz GaN-based monolithic integrated frequency doubler delivering over 0.25 W output power

IF 1 4区 工程技术 Q4 ENGINEERING, ELECTRICAL & ELECTRONIC
Yiyuan Zheng, Kai Zhang, Kunpeng Dai, Huaixin Guo, Jun Qian, Yuechan Kong, Tangsheng Chen
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引用次数: 0

Abstract

A 220 GHz GaN-based monolithic integrated frequency doubler with high continuous-wave output power has been developed. The doubler achieves improved heat dissipation by establishing the terahertz (THz) monolithic integrated circuit topology with GaN Schottky barrier diodes integrated on a high thermal conductivity SiC substrate. It features six anodes to enhance the power-handling capabilities. A refractory Schottky metal stack is adopted for better thermal stability. The doubler realizes satisfactory performance by introducing the suspended microstrip and an all-in-one output structure. For verification, a prototype of the proposed frequency doubler was fabricated and tested. Measured results show that the proposed doubler produces a continuous-wave output power of 255 mW at 220 GHz with an efficiency of 14.6%, exhibiting excellent potential for powerful THz sources.

输出功率超过 0.25 W 的 220 GHz 氮化镓基单片集成倍频器
我们开发了一种具有高连续波输出功率的 220 GHz 氮化镓基单片集成倍频器。该倍频器采用太赫兹(THz)单片集成电路拓扑结构,将 GaN 肖特基势垒二极管集成在高导热性 SiC 衬底上,从而改善了散热性能。它具有六个阳极,可增强功率处理能力。采用了耐火肖特基金属堆栈,以提高热稳定性。通过引入悬浮微带和一体化输出结构,倍增器实现了令人满意的性能。为了进行验证,我们制作并测试了拟议倍频器的原型。测量结果表明,所提出的倍频器在 220 GHz 频率下可产生 255 mW 的连续波输出功率,效率高达 14.6%,显示出强大太赫兹源的巨大潜力。
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来源期刊
Microwave and Optical Technology Letters
Microwave and Optical Technology Letters 工程技术-工程:电子与电气
CiteScore
3.40
自引率
20.00%
发文量
371
审稿时长
4.3 months
期刊介绍: Microwave and Optical Technology Letters provides quick publication (3 to 6 month turnaround) of the most recent findings and achievements in high frequency technology, from RF to optical spectrum. The journal publishes original short papers and letters on theoretical, applied, and system results in the following areas. - RF, Microwave, and Millimeter Waves - Antennas and Propagation - Submillimeter-Wave and Infrared Technology - Optical Engineering All papers are subject to peer review before publication
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