A novel triethylamine gas sensor based on PrVO4 material by hydrothermal synthesis

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2024-10-01 DOI:10.1016/j.vacuum.2024.113700

引用次数: 0

Abstract

Triethylamine (TEA) is a colorless, oily organic compound that can cause serious harm to humans and the environment. Therefore, it is crucial to develop a gas sensor that can rapidly detect TEA. Rare earth vanadate has attracted much attention in the field of sensors due to their strong catalytic effect, good crystallization and chemical stability. In this work, PrVO₄ nanorods were synthesized by hydrothermal method. The crystal structure and morphology of PrVO₄ were characterized by XRD, SEM, TEM and SAED. The novel PrVO₄ gas sensor exhibits excellent gas sensitivity to TEA at 230 °C, including low concentration detection capability, fast adsorption/desorption times (19 s/14 s), good repeatability and long-term stability. In addition, the gas-sensitive mechanism of PrVO₄ is briefly discussed. Therefore, PrVO₄ can be used as a novel gas-sensitizing material.

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基于水热合成 PrVO4 材料的新型三乙胺气体传感器

三乙胺（TEA）是一种无色油状有机化合物，可对人类和环境造成严重危害。因此，开发一种能够快速检测三乙胺的气体传感器至关重要。稀土钒酸盐因其强大的催化作用、良好的结晶性和化学稳定性，在传感器领域备受关注。本研究采用水热法合成了 PrVO4 纳米棒。通过 XRD、SEM、TEM 和 SAED 对 PrVO4 的晶体结构和形貌进行了表征。新型 PrVO4 气体传感器在 230 ℃ 下对三乙醇胺具有优异的气体灵敏度，包括低浓度检测能力、快速吸附/解吸时间（19 s/14 s）、良好的重复性和长期稳定性。此外，还简要讨论了 PrVO4 的气敏机理。因此，PrVO4 可用作一种新型气敏材料。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.