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Hiroaki Misawa Festschrift: Frontiers in Photochemistry

IF 4.3 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC
ACS Applied Electronic Materials Pub Date : 2024-09-26 DOI:10.1021/acs.jpcc.4c0553810.1021/acs.jpcc.4c05538
Kosei Ueno*, Hong-Bo Sun, Paul Mulvaney, Stephan Link and Johan Hofkens, 
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Hiroaki Misawa Festschrift：光化学前沿
本文章由计算机程序翻译，如有差异，请以英文原文为准。
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来源期刊
ACS Applied Electronic Materials
ACS Applied Electronic Materials Multiple-
CiteScore
7.20
自引率
4.30%
发文量
567
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