Influence of glacial acetic acid on the synthesis and performance of WO3 photocatalytic materials

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Ping’an Huang, Xin Yang, Weihao Wu, Suna Zhang, Xiangrong Zhu, Luping Zhu
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Abstract

WO3 with different morphologies and structures was prepared via a simple hydrothermal process. The synthesized samples were characterized via different techniques. The effect of the amount of glacial acetic acid added to the precursor solution on the morphology and structure of WO3 samples was investigated. The amount of glacial acetic acid added was confirmed to be a key parameter in regulating the morphology and microstructure of WO3. The photocatalytic activities of the samples have been examined by the degradation of the model pollutant. The WO3 samples (WO3-20) with {001} facet orientation prepared in the presence of 20 mL glacial acetic acid showed a degradation rate of 96.16% for Rhodamine-B (RhB) within 40 min. The excellent performance should be attributed to its low band gap, high light absorption, excellent electron–hole separation efficiency, preferred orientation growth, and unique morphology. The results of quenching and capture experiments showed that the contribution order of different active species in the photocatalytic process is: ·O2 > ·OH > h+. In addition, the photocatalytic activity of the WO3-20 samples showed slight loses after four cycles, displaying high stability and good recycling performance.

Abstract Image

冰醋酸对 WO3 光催化材料的合成和性能的影响
通过简单的水热法制备了具有不同形态和结构的 WO3。通过不同的技术对合成的样品进行了表征。研究了前驱体溶液中冰醋酸添加量对 WO3 样品形态和结构的影响。结果表明,冰醋酸的添加量是调节 WO3 形貌和微观结构的关键参数。通过降解模型污染物检验了样品的光催化活性。在 20 mL 冰醋酸存在下制备的{001}面取向的 WO3 样品(WO3-20)在 40 分钟内对罗丹明-B(RhB)的降解率达到 96.16%。这种优异的性能应归功于其低带隙、高光吸收、优异的电子-空穴分离效率、优先取向生长和独特的形貌。淬灭和捕获实验结果表明,光催化过程中不同活性物种的贡献顺序为-O2- > -OH > h+。此外,WO3-20 样品的光催化活性在四个周期后略有下降,显示出较高的稳定性和良好的回收性能。
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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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