Dynamic ablation of C/C-SiC-AlSi and C/C-SiC-ZrB2-AlSi at changing impacted angle

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2024-09-10 DOI:10.1016/j.vacuum.2024.113640

引用次数: 0

Abstract

Thermal protection component and jet vane of aircraft with trajectory transfer ability are attacked by heat flow from variable direction. To understand the dynamic ablation characteristics, C/C-SiC-AlSi and C/C-SiC-ZrB₂-AlSi were ablated in plasma at cyclic changing impacted angle (±45^o) and compared with the conventional test at steady state. Accompanied with higher and fluctuant surface temperatures, the periodical changed stress from scouring accelerated the consumption of AlSi matrix and strengthened the mechanical denudation of carbon fiber, which led to severer ablations in the dynamic environment.

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改变冲击角度时的 C/C-SiC-AlSi 和 C/C-SiC-ZrB2-AlSi 动态烧蚀

具有轨迹传输能力的飞机热保护部件和喷气叶片会受到来自不同方向的热流的攻击。为了解动态烧蚀特性，在等离子体中对 C/C-SiC-AlSi 和 C/C-SiC-ZrB2-AlSi 进行了周期性改变冲击角度（±45o）的烧蚀，并与稳态下的传统测试进行了比较。伴随着表面温度的升高和波动，冲刷产生的周期性应力变化加速了 AlSi 基体的消耗，并加强了碳纤维的机械剥蚀，从而导致在动态环境中发生更严重的烧蚀。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.