Recent Advancements in the DIII-D Plasma Control System

IF 1.3 4区物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS

IEEE Transactions on Plasma Science Pub Date : 2024-07-26 DOI:10.1109/tps.2024.3415768

M. W. Margo, H. Shen, B. Penaflor, B. Sammuli, D. Piglowski, D. Eldon, J. Barr, D. Orozco, H. Anand, A. Moser, E. Cho, T. Pederson, J. Le, C. Lasnier, K. Erickson, R. Reed

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DIII-D 等离子控制系统的最新进展

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

IEEE Transactions on Plasma Science 物理-物理：流体与等离子体

CiteScore

3.00

自引率

20.00%

发文量

538

审稿时长

3.8 months

期刊介绍： The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.