On the Radiation Resistance of Tetrafluoroethylene Telomers with Terminal Hydroxyl Groups

IF 0.9 4区化学 Q4 CHEMISTRY, PHYSICAL

High Energy Chemistry Pub Date : 2024-07-23 DOI:10.1134/s0018143924700280

G. A. Kichigina, P. P. Kushch, D. P. Kiryukhin, Yu. M. Shulga

引用次数: 0

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论带有末端羟基的四氟乙烯端聚物的抗辐射性

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

High Energy Chemistry 化学-物理化学

CiteScore

1.50

自引率

28.60%

发文量

审稿时长

6-12 weeks

期刊介绍： High Energy Chemistry publishes original articles, reviews, and short communications on molecular and supramolecular photochemistry, photobiology, radiation chemistry, plasma chemistry, chemistry of nanosized systems, chemistry of new atoms, processes and materials for optical information systems and other areas of high energy chemistry. It publishes theoretical and experimental studies in all areas of high energy chemistry, such as the interaction of high-energy particles with matter, the nature and reactivity of short-lived species induced by the action of particle and electromagnetic radiation or hot atoms on substances in their gaseous and condensed states, and chemical processes initiated in organic and inorganic systems by high-energy radiation.