Ultra-low Refractive Index SiO2 Optical Thin Film with High Mechanical Strength by Sputtering and Electron Beam Evaporation

IF 0.5 Q4 NANOSCIENCE & NANOTECHNOLOGY

E-journal of Surface Science and Nanotechnology Pub Date : 2024-07-11 DOI:10.1380/ejssnt.2024-025

Naoya Tajima, H. Murotani, Takayuki Matsudaira

引用次数: 0

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通过溅射和电子束蒸发实现具有高机械强度的超低折射率二氧化硅光学薄膜

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

E-journal of Surface Science and Nanotechnology NANOSCIENCE & NANOTECHNOLOGY-

CiteScore

1.10

自引率

14.30%

发文量

审稿时长

12 weeks

期刊介绍： Our completely electronic and open-access journal aims at quick and versatile-style publication of research papers on fundamental theory and experiments at frontiers of science and technology relating to surfaces, interfaces, thin films, fine particles, nanowires, nanotubes, and other nanometer-scale structures, and their interdisciplinary areas such as crystal growth, vacuum technology, and so on. It covers their physics, chemistry, biology, materials science, and their applications to advanced technology for computations, communications, memory, catalysis, sensors, biological and medical purposes, energy and environmental problems, and so on.