Influences of deformation defects on etching behaviors of high-strength and high-conductivity Cu alloy for lead frame

IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Jinyang Fang , Qingke Zhang , Jing Li , Feng Liu , Chaofeng Li , Lijing Yang , Cheng Xu , Zhenlun Song
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Abstract

With increasing integration of the semiconductor devices, the requirements on size accuracy and surface quality of the lead frame are higher. Cold-rolling and low-temperature aging are usually used in processing of the Cu alloy for lead frame, which generate/eliminate the deformation defects that affect the etched surface morphology and roughness, while the influence mechanisms have not been well revealed. In this study, the CuCrSn alloy was used as the experimental material, which was cold-rolled to different degree and then aged at 450 °C for different time, and the microstructures and etched surfaces of the specimens were characterized. The results show that etched surface morphologies of grains with different orientations in the coarse-grained Cu alloy are different. With increasing cold-rolling deformation, the influences of grain orientation become less obvious, and the dislocation groups on the slip planes result in grooves approximately parallel to the rolling direction, meanwhile the surface uniformity are improved and the surface roughness decreases. For the 80 % cold-rolled Cu alloy, the density of grooves decreases with increasing aging time and elimination of the dislocations, and the etched surface roughness decreases firstly and then tends to be stable. The etched surface changes significantly and the surface roughness increase obviously after recrystallization of the specimen.

变形缺陷对铅框用高强度、高导电率铜合金蚀刻行为的影响
随着半导体器件集成度的不断提高,对引线框架的尺寸精度和表面质量提出了更高的要求。引线框架用 Cu 合金的加工通常采用冷轧和低温时效处理,冷轧和低温时效处理会产生/消除影响蚀刻表面形貌和粗糙度的变形缺陷,但其影响机制尚未得到很好的揭示。本研究以 CuCrSn 合金为实验材料,对其进行不同程度的冷轧,然后在 450 °C 下进行不同时间的时效处理,并对试样的微观结构和蚀刻表面进行了表征。结果表明,粗晶粒铜合金中不同取向晶粒的蚀刻表面形态是不同的。随着冷轧变形的增加,晶粒取向的影响变得不那么明显,滑移面上的位错群形成了近似平行于轧制方向的沟槽,同时表面均匀性得到改善,表面粗糙度降低。对于 80% 的冷轧铜合金,随着时效时间的延长和位错的消除,沟槽密度减小,蚀刻表面粗糙度先减小后趋于稳定。试样再结晶后,蚀刻表面发生明显变化,表面粗糙度明显增加。
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来源期刊
Microelectronics Reliability
Microelectronics Reliability 工程技术-工程:电子与电气
CiteScore
3.30
自引率
12.50%
发文量
342
审稿时长
68 days
期刊介绍: Microelectronics Reliability, is dedicated to disseminating the latest research results and related information on the reliability of microelectronic devices, circuits and systems, from materials, process and manufacturing, to design, testing and operation. The coverage of the journal includes the following topics: measurement, understanding and analysis; evaluation and prediction; modelling and simulation; methodologies and mitigation. Papers which combine reliability with other important areas of microelectronics engineering, such as design, fabrication, integration, testing, and field operation will also be welcome, and practical papers reporting case studies in the field and specific application domains are particularly encouraged. Most accepted papers will be published as Research Papers, describing significant advances and completed work. Papers reviewing important developing topics of general interest may be accepted for publication as Review Papers. Urgent communications of a more preliminary nature and short reports on completed practical work of current interest may be considered for publication as Research Notes. All contributions are subject to peer review by leading experts in the field.
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