First results of multi-fluid modeling of detached hydrogen plasmas in a linear plasma device using fluid code LINDA-NU

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
Kento Sugiura, Taichi Ido, Hirohiko Tanaka, Hiroki Natsume, Shota Masuda, Kazuo Hoshino, Keiji Sawada, Noriyasu Ohno
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Abstract

In order to simulate hydrogen (H) plasma in the linear plasma device NAGDIS-II, we have modified the fluid code LINDA-NU to allow the simultaneous calculation of multiple ion species consisting of hydrogen atomic ions ( H + $$ {\mathrm{H}}^{+} $$ ) and molecular ions ( H 2 + , H 3 + $$ {\mathrm{H}}_2^{+},{\mathrm{H}}_3^{+} $$ ). In this simulation, H and H 2 $$ {\mathrm{H}}_2 $$ neutrals are assumed to be uniformly distributed in space in order to obtain initial qualitative results. The fraction of H 3 + $$ {\mathrm{H}}_3^{+} $$ ions increases as the H 2 $$ {\mathrm{H}}_2 $$ molecular density increases, and the recombination process between H 3 + $$ {\mathrm{H}}_3^{+} $$ and electrons is observed to reduce the particle flux to the target plate. With an increase in H density, the electron density increases due to the decrease in ion flow velocity due to the change exchange process, and the electron temperature decreases to less than 1 eV, leading to the detached plasma formation attributed to the electron-ion recombination process.

Abstract Image

利用流体代码 LINDA-NU 对线性等离子体装置中的分离氢等离子体进行多流体建模的初步结果
为了模拟线性等离子体装置 NAGDIS-II 中的氢(H)等离子体,我们修改了流体代码 LINDA-NU,使其能够同时计算由氢原子离子()和分子离子()组成的多个离子种类。在该模拟中,假定氢和中性物质在空间均匀分布,以获得初步定性结果。随着分子密度的增加,离子的比例也在增加,并且观察到电子和离子之间的重组过程降低了目标板的粒子通量。随着 H 密度的增加,电子密度会因变化交换过程导致的离子流速降低而增加,电子温度会降低到 1 eV 以下,从而导致电子-离子重组过程所形成的分离等离子体。
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来源期刊
Contributions to Plasma Physics
Contributions to Plasma Physics 物理-物理:流体与等离子体
CiteScore
2.90
自引率
12.50%
发文量
110
审稿时长
4-8 weeks
期刊介绍: Aims and Scope of Contributions to Plasma Physics: Basic physics of low-temperature plasmas; Strongly correlated non-ideal plasmas; Dusty Plasmas; Plasma discharges - microplasmas, reactive, and atmospheric pressure plasmas; Plasma diagnostics; Plasma-surface interaction; Plasma technology; Plasma medicine.
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