Transient thermal 2D FEM analysis of SiC MOSFET in short-circuit operation including high-temperature material laws and phase transition of aluminum source electrode
IF 1.6 4区 工程技术Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Mustafa Shqair, Emmanuel Sarraute, Thibauld Cazimajou, Frédéric Richardeau
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引用次数: 0
Abstract
Understanding the electrothermal behavior of SiC MOSFET power devices under extreme operation conditions, such as short circuits, is crucial for their application certification. However, simulating short circuits in electronic components is challenging due to the necessity of a comprehensive thermal and electrical Multiphysics model that incorporates material laws and respects elevated temperatures with broad ranges. It is also needed to model the melting of the topside Al electrode. The paper presents for the first time a 2D electrothermal FEM that simulates the thermodynamic behavior of SiC MOSFET at high temperatures transistors under short-circuit conditions, including wide-range temperature-dependent material property laws. This work models the Al phase transition by considering the apparent heat capacity method and including the latent heat absorbed during the Al solid-liquid phase change (PC). The geometric accuracy of this study provides significant added values compared to existing 1D models. It was deduced that including the temperature-dependent material laws highly impacted the results. The rise in SiC junction temperature led to a delay in the onset of Al melting. It also impacted the progression manner of the Al melting process after the formation of new melting fronts.
了解 SiC MOSFET 功率器件在短路等极端工作条件下的电热行为对其应用认证至关重要。然而,模拟电子元件中的短路具有挑战性,因为必须要有一个全面的热学和电学多物理场模型,该模型应包含材料定律,并尊重宽范围的高温。此外,还需要建立顶部铝电极熔化的模型。本文首次提出了二维电热有限元模型,该模型模拟了短路条件下 SiC MOSFET 晶体管在高温下的热力学行为,包括与温度相关的宽范围材料特性定律。这项研究采用表观热容量法,并将铝固液相变 (PC) 过程中吸收的潜热计算在内,从而建立了铝相变模型。与现有的一维模型相比,这项研究的几何精度提供了显著的附加值。据推断,加入与温度相关的材料定律会对结果产生很大影响。碳化硅结温的升高导致了铝熔化的延迟。在形成新的熔化前沿后,它还会影响铝熔化过程的进展方式。
期刊介绍:
Microelectronics Reliability, is dedicated to disseminating the latest research results and related information on the reliability of microelectronic devices, circuits and systems, from materials, process and manufacturing, to design, testing and operation. The coverage of the journal includes the following topics: measurement, understanding and analysis; evaluation and prediction; modelling and simulation; methodologies and mitigation. Papers which combine reliability with other important areas of microelectronics engineering, such as design, fabrication, integration, testing, and field operation will also be welcome, and practical papers reporting case studies in the field and specific application domains are particularly encouraged.
Most accepted papers will be published as Research Papers, describing significant advances and completed work. Papers reviewing important developing topics of general interest may be accepted for publication as Review Papers. Urgent communications of a more preliminary nature and short reports on completed practical work of current interest may be considered for publication as Research Notes. All contributions are subject to peer review by leading experts in the field.