Multi-level storage in cleaved-gate ferroelectric FETs investigated by 3D phase-field-based quantum transport simulation

IF 1.4 4区 物理与天体物理 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Jeonghwan Jang, Hyeongu Lee, Mincheol Shin
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引用次数: 0

Abstract

In this work, we investigate the feasibility of cleaved-gate ferroelectric FET (CG-FeFET) as multi-level cell (MLC) memory devices, by conducting 3-dimensional quantum transport simulations based on time-dependent-Ginzburg–Landau equation, and the non-equilibrium Green’s function method. Our results indicate that CG-FeFET can achieve multi-level operations by utilizing different thicknesses of the ferroelectric layer. We analyze the influence of electron–phonon interaction and also verify that CG-FeFET is robust to noise. Furthermore, we identify the critical role of the spacing between two ferroelectric layers in determining the memory window, considering the effects of polarization cancellation and electrostatic coupling. These findings provide valuable insights into designing stable and reliable nonvolatile memory technologies, which could offer potential solutions for high-density memory requirements.

通过基于三维相场的量子输运模拟研究裂隙栅铁电场效应晶体管中的多级存储
在这项研究中,我们基于与时间相关的金兹堡-朗道方程和非平衡格林函数法进行了三维量子输运模拟,研究了裂栅铁电场效应晶体管(CG-FeFET)作为多电平单元(MLC)存储器件的可行性。结果表明,CG-FeFET 可以利用不同厚度的铁电层实现多级运行。我们分析了电子-声子相互作用的影响,还验证了 CG-FeFET 对噪声的鲁棒性。此外,考虑到极化抵消和静电耦合的影响,我们确定了两个铁电层之间的间距在决定存储器窗口方面的关键作用。这些发现为设计稳定可靠的非易失性存储器技术提供了宝贵的见解,为满足高密度存储器需求提供了潜在的解决方案。
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来源期刊
Solid-state Electronics
Solid-state Electronics 物理-工程:电子与电气
CiteScore
3.00
自引率
5.90%
发文量
212
审稿时长
3 months
期刊介绍: It is the aim of this journal to bring together in one publication outstanding papers reporting new and original work in the following areas: (1) applications of solid-state physics and technology to electronics and optoelectronics, including theory and device design; (2) optical, electrical, morphological characterization techniques and parameter extraction of devices; (3) fabrication of semiconductor devices, and also device-related materials growth, measurement and evaluation; (4) the physics and modeling of submicron and nanoscale microelectronic and optoelectronic devices, including processing, measurement, and performance evaluation; (5) applications of numerical methods to the modeling and simulation of solid-state devices and processes; and (6) nanoscale electronic and optoelectronic devices, photovoltaics, sensors, and MEMS based on semiconductor and alternative electronic materials; (7) synthesis and electrooptical properties of materials for novel devices.
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