Separation of ReO4 −/TcO4 − from simulated radioactive waste liquid by a novel series of anion exchange resins

IF 1.4 3区化学 Q4 CHEMISTRY, INORGANIC & NUCLEAR

Radiochimica Acta Pub Date : 2024-03-28 DOI:10.1515/ract-2023-0261

Yiwei Huang, Xinlong Chen, Yinglin Shen, Xiaomin Li, Xupeng Zhi, Peng Liu, Meiying Liu, Bin Liu

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引用次数: 0

Abstract

Selective removal of 99TcO₄− from radioactive wastewater is a challenging but significant task, which benefits spent fuel reprocessing and radioactive-waste leakage treatment. This work introduces the performance of adsorption ReO4 − using a series of novel anion exchange resins, namely MAPE-1, MAPE-2, MAPE-3, and MAGD-1, impregnated with functionalized ionic liquids as active sites. They exhibit a high selectivity towards TcO₄−/ReO₄−, in a wide pH range of pH 5–11 for ReO₄−/TcO₄− adsorption. Among these resins, MAPE-1 has the best adsorption performance for ReO4 −, with a maximum adsorption capacity of 202.4 mg/g and a high distribution ratio K d of 6.2 × 10⁶ mL/g at pH 7. The adsorption mechanism involves anion exchange between functionalized ionic liquids and TcO₄−/ReO₄−, which is supported by X-ray energy dispersive spectroscopy (EDS) and Fourier Transform Infrared spectroscopy (FT-IR) analyses. In addition, X-ray photoelectron spectroscopy (XPS) further illustrates the interaction between the resin and perrhenate.

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利用新型阴离子交换树脂系列从模拟放射性废液中分离 ReO4 -/TcO4 -

从放射性废水中选择性去除 99TcO₄- 是一项具有挑战性但意义重大的任务，有利于乏燃料后处理和放射性废物泄漏处理。这项工作介绍了使用一系列新型阴离子交换树脂（即 MAPE-1、MAPE-2、MAPE-3 和 MAGD-1）吸附 ReO4 - 的性能，这些树脂浸渍了功能化离子液体作为活性位点。在 pH 值为 5-11 的广泛 pH 值范围内，它们对 TcO₄-/ReO₄- 具有很高的选择性，可吸附 ReO₄-/TcO₄-。在这些树脂中，MAPE-1 对 ReO4 - 的吸附性能最好，pH 值为 7 时的最大吸附容量为 202.4 mg/g，分布比 K d 高达 6.2 × 10⁶ mL/g。吸附机理涉及官能化离子液体与 TcO₄-/ReO₄- 之间的阴离子交换，这一点得到了 X 射线能量色散光谱（EDS）和傅立叶变换红外光谱（FT-IR）分析的支持。此外，X 射线光电子能谱（XPS）进一步说明了树脂与过铼酸盐之间的相互作用。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Radiochimica Acta 化学-核科学技术

CiteScore

2.90

自引率

16.70%

发文量

审稿时长

6 months

期刊介绍： Radiochimica Acta publishes manuscripts encompassing chemical aspects of nuclear science and technology.