L. Ghizzo , D. Trémouilles , F. Richardeau , G. Guibaud
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引用次数: 0
Abstract
The fluctuation of the threshold voltage (Vth) presents a challenge while monitoring electrical drift in reliability studies of GaN HEMTs. While technologies, such as ohmic p-GaN, may lessen Vth fluctuations, the issue of recoverable charge trapping still remains. Therefore, it is crucial to adopt novel characterization methods when conducting reliability studies, in order to measure intrinsic changes rather than the charge-trapping effects that exist even in non-degraded transistors. One method expounded in this paper allows for a reliable and replicable measurement of Vth for an ohmic p-GaN gate HEMT GaN. A dedicated gate-bias profile is introduced immediately prior to the threshold-voltage measurement to stabilize it. This preconditioning phase necessitates a negative bias voltage followed by a suitably high voltage to be effective. The novel protocol introduced is also shown to be applicable to other HEMT GaN structures.
期刊介绍：
It is the aim of this journal to bring together in one publication outstanding papers reporting new and original work in the following areas: (1) applications of solid-state physics and technology to electronics and optoelectronics, including theory and device design; (2) optical, electrical, morphological characterization techniques and parameter extraction of devices; (3) fabrication of semiconductor devices, and also device-related materials growth, measurement and evaluation; (4) the physics and modeling of submicron and nanoscale microelectronic and optoelectronic devices, including processing, measurement, and performance evaluation; (5) applications of numerical methods to the modeling and simulation of solid-state devices and processes; and (6) nanoscale electronic and optoelectronic devices, photovoltaics, sensors, and MEMS based on semiconductor and alternative electronic materials; (7) synthesis and electrooptical properties of materials for novel devices.
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