Cover image from M. M. Shawrav, H. D. Wanzenboeck, and co-workers (Chem. Vap. Deposition 2014, 20, 251)

Chemical Vapor Deposition Pub Date : 2014-09-10 DOI:10.1002/cvde.201477891

引用次数: 0

Abstract

The cover image illustrates the use of focused-electron-beam-induced CVD to directly write nanostructures with nanometer resolution. The Au-Fe nanoalloys produced have potential applications in nanoelectronics.

Abstract Image

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封面图片来自M. M. Shawrav, H. D. Wanzenboeck及其同事。Vap。沉积学报，2014,20,251)

封面图说明了使用聚焦电子束诱导CVD直接写入纳米分辨率的纳米结构。所制备的Au-Fe纳米合金在纳米电子学方面具有潜在的应用前景。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Chemical Vapor Deposition 工程技术-材料科学：膜

自引率

0.00%

发文量

审稿时长

>12 weeks

期刊介绍： Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.