Surface Reactivity of the Au-Si-Ho Quasicrystalline 1/1 Approximant

IF 2.3 4区 化学 Q3 CHEMISTRY, MULTIDISCIPLINARY
Wilfried Bajoun Mbajoun, Yu-Chin Huang, Girma Hailu Gebresenbut, Cesar Pay Gómez, Vincent Fournée, Julian Ledieu
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引用次数: 0

Abstract

The oxidation of the (100) surface of Au-Si-Ho quasicrystalline approximant was studied using low-energy electron diffraction and X-ray photoelectron spectroscopy. The combination of these two techniques provides evidence for a Ho and Si surface segregation induced by O2 adsorption, resulting in the loss of surface long-range order.

Abstract Image

Abstract Image

Au - Si - Ho准晶1/1近似的表面反应性
摘要利用低能电子衍射和X射线光电子能谱研究了Au - Si - Ho准晶近似物(100)表面的氧化过程。这两种技术的结合为o2吸附引起的Ho和Si表面偏析提供了证据,导致表面长程有序的损失。
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来源期刊
Israel Journal of Chemistry
Israel Journal of Chemistry 化学-化学综合
CiteScore
6.20
自引率
0.00%
发文量
62
审稿时长
6-12 weeks
期刊介绍: The fledgling State of Israel began to publish its scientific activity in 1951 under the general heading of Bulletin of the Research Council of Israel, which quickly split into sections to accommodate various fields in the growing academic community. In 1963, the Bulletin ceased publication and independent journals were born, with Section A becoming the new Israel Journal of Chemistry. The Israel Journal of Chemistry is the official journal of the Israel Chemical Society. Effective from Volume 50 (2010) it is published by Wiley-VCH. The Israel Journal of Chemistry is an international and peer-reviewed publication forum for Special Issues on timely research topics in all fields of chemistry: from biochemistry through organic and inorganic chemistry to polymer, physical and theoretical chemistry, including all interdisciplinary topics. Each topical issue is edited by one or several Guest Editors and primarily contains invited Review articles. Communications and Full Papers may be published occasionally, if they fit with the quality standards of the journal. The publication language is English and the journal is published twelve times a year.
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