Photoresist developer reclamation technology and system

H. Sugawara, Y. Tajima, T. Ohmi
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引用次数: 2

Abstract

A tetramethylammonium hydroxide (TMAH) generally used as photoresist developer for manufacturing LSIs and LCDs is recovered from developer waste (spent developer) using an electrodialysis (ED) method, and purified by ion exchange (IE) technologies. Reclaimed developer features analytically the same purity as commercial fresh one. This reclamation system can achieve a stably high TMAH recovery rate of more than 80%. Furthermore, it has the great advantages of saving operating costs, which amounts to 66.2% (for LSI) and 78.3% (for LCD) total cost reduction compared with conventional no reclamation system in a case study, as well as reducing environmental load.
光刻胶显影剂回收技术及系统
采用电渗析(ED)方法从显影剂废料(废显影剂)中回收四甲基氢氧化铵(TMAH),并用离子交换(IE)技术纯化。从分析上看,再生开发液的纯度与商业新鲜开发液相同。该回收系统可实现稳定的高TMAH回收率达80%以上。此外,它还具有节约运营成本的巨大优势,在案例研究中,与传统的无回收系统相比,总成本降低了66.2% (LSI)和78.3% (LCD),并减少了环境负荷。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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