{"title":"Domain patterned permalloy incorporated above and below on-chip RF spiral inductors","authors":"Vasu Pulijala, Syed Azeemuddin","doi":"10.1109/IMARC.2015.7411428","DOIUrl":null,"url":null,"abstract":"This paper discusses the effects of domain patterned Permalloy incorporated above and below on-chip planar spiral inductors. There is an improvement of 35% in inductance and 135% in quality factor compared to the control structure.","PeriodicalId":307742,"journal":{"name":"2015 IEEE MTT-S International Microwave and RF Conference (IMaRC)","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 IEEE MTT-S International Microwave and RF Conference (IMaRC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMARC.2015.7411428","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
This paper discusses the effects of domain patterned Permalloy incorporated above and below on-chip planar spiral inductors. There is an improvement of 35% in inductance and 135% in quality factor compared to the control structure.