The Verification of the Expression of the Interaction Impedance and Ohmic Losses of the Nonuniform-grating-based Slow Wave Structure

2020 IEEE 21st International Conference on Vacuum Electronics (IVEC) Pub Date : 2020-10-19 DOI:10.1109/IVEC45766.2020.9520595

Fengzhen Zhang, Zhaochuan Zhang, Dongping Gao, Xiaoyan Wang

引用次数: 0

Abstract

The expression of the interaction impedance of the nonuniform-grating-based slow wave structure (SWS) is given in this paper. The verification of the expression of the interaction impedance and Ohmic losses of the non-dielectric-loaded (NDL) SWS and partially dielectric-loaded (PDL) SWS is verified by simulations.

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基于非均匀光栅的慢波结构相互作用阻抗和欧姆损耗表达式的验证

本文给出了基于非均匀光栅的慢波结构的相互作用阻抗表达式。通过仿真验证了非介电负载(NDL)和部分介电负载(PDL) SWS相互作用阻抗和欧姆损耗表达式的正确性。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

2020 IEEE 21st International Conference on Vacuum Electronics (IVEC)

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