From atomic-scale interfaces — To new nanomaterials

Abstract

The problem of the synthesis of new type nanomaterials in the form of nano-coatings with sub-nanometric heterogeneity has been formulated. It has been presented an analysis of influences of physical vapor deposition in ultrahigh vacuum on the process of intermixing a film with a substrate, including the results, which has been obtained under the formation of transition metal – silicon interface. The generalization of the obtained experimental results develops an approach to the development of new nano-coatings with low-dimensional heterogeneity. The principles of constructing such low-dimensional nano-coatings, their properties and possible applications are considered.