{"title":"Chemical reaction at high temperature and high pressure III : reaction of silicon and phosphorus at high temperature and high pressure","authors":"J. Ōsugi, R. Namikawa, Yoshiyuki Tanaka","doi":"10.2183/pjab1945.42.48","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":265588,"journal":{"name":"The Review of Physical Chemistry of Japan","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1966-10-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"The Review of Physical Chemistry of Japan","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.2183/pjab1945.42.48","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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