Aluminum plug formation by excimer laser irradiation for planarized multilevel metallization

R. Mukai, K. Kobayashi, M. Nakano
{"title":"Aluminum plug formation by excimer laser irradiation for planarized multilevel metallization","authors":"R. Mukai, K. Kobayashi, M. Nakano","doi":"10.1109/VMIC.1989.78049","DOIUrl":null,"url":null,"abstract":"Summary form only given. An aluminum-plug-formation technique achieved by excimer laser irradiation for planarized multilevel metallization is presented. The plug was formed by pyrolytic reactions using pulses from an XeCl excimer laser (150 mJ). The optical pulses are focused on an optical system to increase optical fluence. The optical system redefines and homogenizes the laser beam to a size of 2*2 mm/sup 2/ and is mounted on an X-Y stage which tracks the beam across the sample. A plug formed by four pulses is shown. During the irradiation, the sample was kept at room temperature, and the total of the amount of aluminum was controlled to just fill in each via hole. On the resulting surface insulator, aluminum is not found.<<ETX>>","PeriodicalId":302853,"journal":{"name":"Proceedings., Sixth International IEEE VLSI Multilevel Interconnection Conference","volume":"100 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1989-06-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings., Sixth International IEEE VLSI Multilevel Interconnection Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VMIC.1989.78049","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

Summary form only given. An aluminum-plug-formation technique achieved by excimer laser irradiation for planarized multilevel metallization is presented. The plug was formed by pyrolytic reactions using pulses from an XeCl excimer laser (150 mJ). The optical pulses are focused on an optical system to increase optical fluence. The optical system redefines and homogenizes the laser beam to a size of 2*2 mm/sup 2/ and is mounted on an X-Y stage which tracks the beam across the sample. A plug formed by four pulses is shown. During the irradiation, the sample was kept at room temperature, and the total of the amount of aluminum was controlled to just fill in each via hole. On the resulting surface insulator, aluminum is not found.<>
准分子激光在平面化多层金属化中形成铝塞
只提供摘要形式。提出了一种准分子激光在平面化多层金属化中实现铝塞成形的方法。利用XeCl准分子激光(150 mJ)的脉冲进行热裂解反应形成堵塞物。光脉冲聚焦在光学系统上,以增加光通量。光学系统将激光束重新定义并均匀化到2*2 mm/sup /的尺寸,并安装在X-Y平台上,该平台跟踪光束穿过样品。如图所示,一个由四个脉冲组成的塞。在辐照过程中,样品在室温下保存,铝的总量控制在每个通孔刚好填满。在产生的表面绝缘子上,没有发现铝
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