Influence of chemical structure in styrene copolymers subjected to partial discharges

Abstract

The authors present data on the PD (partial discharge) resistance of styrene copolymers containing a number of different styrene monomers with electron-withdrawing and electron-donating substituents. The presence of pentafluorostyrene (PFS) in the polymer chain is shown to have a clearly negative influence on the resistance to PD. Preliminary results show that polystyrene itself has a very good stability with respect to PD. The electron-donating p-methoxystyrene monomer has a clearly negative influence on the PD stability. P-methylstyrene and p-chlorostyrene do not differ appreciably from styrene regarding PD resistance.<>