Electrochemical etching of porous-pyramids structure with low reflectance

A. Lounas, K. Khaldi, N. Gabouze, H. Menari, Nait Bouda
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Abstract

By anisotropic etching, pyramids structured silicon can be prepared using sodium hypochlorite for monocrystalline solar cells. Their influence on the reflectance of the silicon surface was studied to optimize the etching and reduce the optical losses of silicon surface more effectively. However, currently the reflectance of the pyramids structured silicon surface can only be reduced to above 10%in the visible range, which is still too high for high efficiency solar cells. Porous pyramids structured silicon is a promising antireflection coating to solve the problem of high surface reflectance in silicon solar cells. In this paper, a promising method for fabricating porous pyramids compound structure on silicon surface was proposed. The silicon surface was first texturized in NaOCl/C2H5OH and then electrochemically etched in HF/C2H5OH solution. The average reflectance of the surface in the range of 500-900 nm was as low as 5%. The surfaces prepared under optimized condition were investigated by Scanning Electron Microscopy (SEM) and Spectrophotometry.
低反射率多孔金字塔结构的电化学腐蚀
利用各向异性蚀刻技术,利用次氯酸钠制备了单晶太阳能电池用金字塔结构硅。研究了它们对硅表面反射率的影响,以优化蚀刻工艺,更有效地降低硅表面的光学损耗。然而,目前金字塔结构硅表面的反射率只能在可见光范围内降低到10%以上,这对于高效太阳能电池来说仍然太高。多孔金字塔结构硅是解决硅太阳电池高表面反射率问题的一种很有前途的增透涂层。提出了一种在硅表面制备多孔金字塔复合结构的新方法。硅表面首先在NaOCl/C2H5OH中织构,然后在HF/C2H5OH溶液中电化学蚀刻。表面在500 ~ 900 nm范围内的平均反射率低至5%。用扫描电镜和分光光度法对优化条件下制备的表面进行了表征。
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