Non-Arrhenius Temperature Acceleration and Stress-Dependent Voltage Acceleration for Semiconductor Device Involving Multiple Failure Mechanisms

J. Qin, J. Bernstein
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引用次数: 16

Abstract

In this paper, we study temperature and voltage acceleration of semiconductor device with multiple intrinsic failure mechanisms involved: hot carrier injection (HCI), time dependent dielectric breakdown (TDDB) and negative bias temperature instability (NBTI). Simulation shows that system activation energy and voltage acceleration parameter depend on stress temperature and voltage. A modified Arrhenius relationship is proposed to model the temperature dependence of device lifetime at given voltage. A modified exponential model is also proposed to model the voltage dependence of device lifetime at given temperature
涉及多种失效机制的半导体器件的非arrhenius温度加速和应力相关电压加速
本文研究了半导体器件在热载流子注入(HCI)、时间相关介质击穿(TDDB)和负偏置温度不稳定性(NBTI)等多种内在失效机制下的温度和电压加速问题。仿真结果表明,系统激活能和电压加速参数与应力温度和电压有关。提出了一个修正的Arrhenius关系来模拟给定电压下器件寿命的温度依赖性。提出了一种修正的指数模型来模拟给定温度下器件寿命对电压的依赖关系
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