{"title":"Ultra low on-resistance Super 3D MOSFET under 300 V breakdown voltage","authors":"J. Sakakibara, Y. Urakami, H. Yamaguchi","doi":"10.1109/WCT.2004.239933","DOIUrl":null,"url":null,"abstract":"For the range of under 300 V breakdown voltage, we have already proposed a new structural power MOSFET that we call Super 3D MOSFET. At 70 V breakdown voltage, the simulated total specific on-resistance was 19 mohm.mm/sup 2/, and below the R/sub on/ Si limit. In this work, we present the structural design for the breakdown voltage, taking the electric field concentration into consideration at its 3-dimensional corner. Furthermore, we present the experimental results for an actual prototype fabrication. The on-resistance and breakdown voltage are respectively 27 mohm.mm/sup 2/ and 49 V. This on-resistance is reduced drastically in comparison with the conventional trench-gated MOSFET.","PeriodicalId":303825,"journal":{"name":"2004 Proceedings of the 16th International Symposium on Power Semiconductor Devices and ICs","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-05-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2004 Proceedings of the 16th International Symposium on Power Semiconductor Devices and ICs","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/WCT.2004.239933","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
For the range of under 300 V breakdown voltage, we have already proposed a new structural power MOSFET that we call Super 3D MOSFET. At 70 V breakdown voltage, the simulated total specific on-resistance was 19 mohm.mm/sup 2/, and below the R/sub on/ Si limit. In this work, we present the structural design for the breakdown voltage, taking the electric field concentration into consideration at its 3-dimensional corner. Furthermore, we present the experimental results for an actual prototype fabrication. The on-resistance and breakdown voltage are respectively 27 mohm.mm/sup 2/ and 49 V. This on-resistance is reduced drastically in comparison with the conventional trench-gated MOSFET.