Thermal annealing impact on the properties of CdxHg1-xTe epitaxial layers with anodic oxidation

E. Huseynov, Sh. O. Eminov, A. A. Radjabli, N. D. Isamyilov, T. Ibragimov
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Abstract

From the point of view of its fundamental properties, solid solution Hg1-xCdxTe (0 less than or equal to x less than or equal to l) (MCT) is one of very attractive materials of infrared optoelectronics and has received considerable attention over the past forty odd years. In the early 90s, bulk growth of MCT was phased out for the routine production of first generation photo-conductive devices. But it is hard process to growth MCT single crystals with homogeneous composition. This fact determined a vital importance change in the MCT technology during the last decade which first at all induced by the mostly replacement of bulk growth by epitaxial technologies (LPE, MBE, VPE etc.).
热退火对阳极氧化CdxHg1-xTe外延层性能的影响
从其基本性质来看,固溶体Hg1-xCdxTe(0小于等于x小于等于l) (MCT)是红外光电子学中非常有吸引力的材料之一,在过去的四十多年里受到了广泛的关注。在90年代早期,MCT的大量增长被第一代光导器件的常规生产所淘汰。但要生长出成分均匀的MCT单晶是一个困难的过程。这一事实决定了在过去十年中MCT技术的一个至关重要的变化,首先是由外延技术(LPE, MBE, VPE等)取代体生长引起的。
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