Yongkyun Kim, Kihun Seong, Donggi Lee, Seungchan Moon, Hyun-Mi Kim, Hyeongkeun Kim, Seul-Gi Kim, Jinho Ahn
{"title":"Feasibility of nanometer-thickness molybdenum carbide film for extreme ultraviolet lithography pellicle","authors":"Yongkyun Kim, Kihun Seong, Donggi Lee, Seungchan Moon, Hyun-Mi Kim, Hyeongkeun Kim, Seul-Gi Kim, Jinho Ahn","doi":"10.1117/12.2643003","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":374992,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2022","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Extreme Ultraviolet Lithography 2022","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2643003","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}