Quadratic Nonlinear Optical Coefficient of AlxGai-xAs Thin Film

M. Ohashi, T. Kondo, R. Ito, S. Fukatsu, Y. Shiraki, K. Kumata, S. Kano
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Abstract

Recently there has been considerable interest in surface-emitting second-harmonic (SH) generators fabricated from the AlxGa1-xAs system.1,2) No systematic data are available, however, on the d coefficients of AlxGa1-xAs1,3,4) A major reason for this is that many interesting semiconductors, including AlxGa1-xAs, are obtainable only in the form of a thin epitaxial layer. Furthermore, the substrate is often absorptive at SH frequencies. We have developed a new method for characterizing the optical nonlinearity of such thin-film materials on the basis of the method of reflected harmonics.5) The new method has been applied to the determination of the coefficient d14 of AlxGa1-xAs as a function of x, the AlAs composition of the alloy semiconductor.
AlxGai-xAs薄膜的二次非线性光学系数
最近,人们对用AlxGa1-xAs系统制造的表面发射二次谐波(SH)发生器产生了相当大的兴趣。1,2)然而,没有关于AlxGa1-xAs1的d系数的系统数据1,3,4),主要原因是许多有趣的半导体,包括AlxGa1-xAs,只能以薄外延层的形式获得。此外,衬底在SH频率下通常具有吸收性。我们在反射谐波法的基础上,提出了表征这类薄膜材料光学非线性的新方法。5)该新方法已应用于测定合金半导体中AlxGa1-xAs的系数d14随AlxGa1-xAs成分x的函数。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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