Comparison of nonlocal means despeckling based on stochastic measures

R. Grimson, N. S. Morandeira, A. Frery
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引用次数: 7

Abstract

This work presents the use of stochastic measures of similarities as features with statistical significance for the design of despeckling nonlocal means filters. Assuming that the observations follow a Gamma model with two parameters (mean and number of looks), patches are compared by means of the Kullback-Leibler and Hellinger distances, and by their Shannon entropies. A convolution mask is formed using the p-values of tests that verify if the patches come from the same distribution. The filter performances are assessed using well-known phantoms, three measures of quality, and a Monte Carlo experiment with several factors. The proposed filters are contrasted with the Refined Lee and NL-SAR filters.
基于随机测度的非局部均值去斑比较
这项工作提出了使用相似度的随机度量作为特征具有统计显著性的设计去斑非局部均值滤波器。假设观测结果遵循具有两个参数(平均和观测次数)的Gamma模型,通过Kullback-Leibler和Hellinger距离以及它们的Shannon熵来比较斑块。使用验证patch是否来自同一分布的测试的p值形成卷积掩模。滤波器的性能评估使用众所周知的幻影,三种测量质量,和蒙特卡罗实验与几个因素。本文提出的滤波器与改进的Lee和NL-SAR滤波器进行了对比。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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