Comprehensive cycle time reduction program at AMD's fab25

F. Sadjadi, T. Baker
{"title":"Comprehensive cycle time reduction program at AMD's fab25","authors":"F. Sadjadi, T. Baker","doi":"10.1109/ISSM.2001.962923","DOIUrl":null,"url":null,"abstract":"Manufacturing cycle time at AMD's Fab25 Austin, Texas facility has improved from the bottom third to the top of Sematech's cycle time per mask layer metric list. Steady improvement in cycle time performance has been attained in the midst of a steep ramp from 0.25 /spl mu/m to 0.18 /spl mu/m technology. This paper explains the fundamental changes that were made to accomplish these improvements and evaluate their impact upon Fab25's cycle time reduction efforts. Focus areas of interest are: philosophy and behavior, modeling, dispatching, planning, and operations.","PeriodicalId":356225,"journal":{"name":"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)","volume":"35 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-10-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM.2001.962923","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

Abstract

Manufacturing cycle time at AMD's Fab25 Austin, Texas facility has improved from the bottom third to the top of Sematech's cycle time per mask layer metric list. Steady improvement in cycle time performance has been attained in the midst of a steep ramp from 0.25 /spl mu/m to 0.18 /spl mu/m technology. This paper explains the fundamental changes that were made to accomplish these improvements and evaluate their impact upon Fab25's cycle time reduction efforts. Focus areas of interest are: philosophy and behavior, modeling, dispatching, planning, and operations.
AMD fab25的全面周期缩短计划
AMD的Fab25 Austin, Texas工厂的制造周期时间已经从Sematech的每个掩膜层周期时间列表的倒数第三位提高到顶部。在从0.25 /spl mu/m到0.18 /spl mu/m技术的陡峭斜坡中,循环时间性能得到了稳步改善。本文解释了为实现这些改进所做的基本改变,并评估了它们对Fab25缩短循环时间的影响。关注的重点领域是:哲学和行为、建模、调度、计划和操作。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信