Impact of strain on electrical performance of Silicon Nanowire MOSFET

F. Hamid, A. Hamzah, A. Mohamad, R. Ismail, M. Razali
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Abstract

A 3-Dimensional (3D) strained Silicon Nanowire MOSFET simulation and inversion charge model are presented. The simulation studies are conducted based on electrical parameters of nanowires such as current and threshold voltage using a ATLAS TCAD simulator. The inversion charge model with Germanium fraction is formulated using a unified charge model. These characterization studies are performed to investigate the performance of Silicon Nanowire based on the strain effect. The simulation and modeling works have been compared with numerical simulations. Findings have shown that the strained Silicon Nanowire performs better compared to the unstrained Silicon Nanowire MOSFET, where the on-state current increased, threshold voltage shifted by 0.2 V and inversion charge density improved by 30%.
应变对硅纳米线MOSFET电性能的影响
提出了一种三维应变硅纳米线MOSFET的仿真和电荷倒置模型。利用ATLAS TCAD模拟器对纳米线的电流和阈值电压等电学参数进行了仿真研究。采用统一的电荷模型建立了含锗分数的倒置电荷模型。这些表征研究是为了研究基于应变效应的硅纳米线的性能。将模拟和建模工作与数值模拟进行了比较。结果表明,应变硅纳米线与未应变硅纳米线MOSFET相比性能更好,导通电流增加,阈值电压移动0.2 V,反转电荷密度提高30%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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