Chemical-Vapor-Deposited Diamond Film

K. Miyoshi
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Abstract

This chapter describes the nature of clean and contaminated diamond surfaces, Chemical-vapor-deposited (CVD) diamond film deposition technology, analytical techniques and the results of research on CVD diamond films, and the general properties of CVD diamond films. Further, it describes the friction and wear properties of CVD diamond films in the atmosphere, in a controlled nitrogen environment, and in an ultra-high-vacuum environment.
化学气相沉积金刚石薄膜
本章介绍了清洁和污染金刚石表面的性质,化学气相沉积(CVD)金刚石膜沉积技术,CVD金刚石膜的分析技术和研究成果,以及CVD金刚石膜的一般特性。进一步介绍了CVD金刚石薄膜在大气、可控氮环境和超高真空环境下的摩擦磨损性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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