A study of different extraction techniques of nanocrystalline graphite (NCG)/p-type silicon schottky diode parameters

A. A. Nawawi, S. M. Sultan, S. Rahman, S. H. Pu, J. McBride, L. H. Wah
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引用次数: 3

Abstract

This article demonstrates the investigation of the Schottky barrier height and ideality factor extraction techniques of a Nano Crystalline Graphite (NCG)/p-type silicon Schottky barrier diode based on current-voltage characteristics. A series resistance of 12.5 kΩ was obtained from the linear slope of the I-V plot. By taking into account of the series resistance, different techniques of graphical fitting methods were explored. In this experiment, the Schottky barrier height (SBH) was found to be lower than found in the literature for graphene/Si Schottky diode and will be discussed in detail. However, the ideality factor of 1.1 was achieved using a reverse bias I-V plot. This shows NCG/p-Si Schottky diode followed thermionic emission mechanism.
纳米晶石墨/p型硅肖特基二极管参数的不同提取工艺研究
本文研究了基于电流-电压特性的纳米晶体石墨/p型硅肖特基势垒二极管的肖特基势垒高度和理想因子提取技术。由I-V曲线的线性斜率得到串联电阻12.5 kΩ。在考虑串联电阻的情况下,探讨了不同的图形拟合方法。在本实验中,发现石墨烯/硅肖特基二极管的肖特基势垒高度(SBH)低于文献中发现的,并将详细讨论。然而,使用反向偏置I-V图实现了1.1的理想因子。这表明NCG/p-Si肖特基二极管遵循热离子发射机制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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