Field emission of clean and oxidized Mo<110> microtips

Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737) Pub Date : 2004-07-11 DOI:10.1109/IVNC.2004.1354916

X. Zhao, R. Outlaw, R. Champion, J.J. Wang, D. Manos, B. Holloway

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Abstract

In this paper, measurements of field emission taken on a molybdenum<110> microtip under ultrahigh vacuum conditions and as a function of oxygen exposure were reported. Auger electron spectroscopy (AES) was used to examine the clean and oxygen saturated surface of the Mo surface and the peak-to-peak ratio of O (KLL) to Mo (LMM) as a function of oxygen exposure.

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清洁氧化Mo微针尖的场发射

本文报道了在超高真空条件下钼微针尖上的场发射及其与氧暴露的关系。利用俄歇电子能谱(AES)研究了Mo表面的清洁和氧饱和表面，以及O (KLL)与Mo (LMM)的峰峰比与氧暴露的关系。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737)

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