Particle control in the DIII-D advanced divertor

M. J. Schaffer, S. Lippmann, M. Mahdavi, T. Petrie, R. Stambaugh, J. Hogan, C. Klepper, P. Mioduszewski, L. W. Owen, D. N. Hill, M. Rensink, D. Buchenauer
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引用次数: 1

Abstract

A novel, electrically biasable, semiclosed divertor was installed and operated in the DIII-D lower outside divertor location. The semiclosed divertor has yielded static gas pressure buildups in the pumping plenum in excess of 10 mtorr. Electrical bias controls the distribution of particle recycle between the inner and outer divertors by E*B drifts. Depending on sign, bias increases or decreases the plenum gas pressure. Bias greatly reduces the sensitivity of plenum pressure to separatrix position. In particular, E*B drifts in the DIII-D geometry can direct plasma across a divertor target and then optimally into the pumping aperture. Bias, even without active pumping, has also demonstrated a limited control of ELMing H-mode plasma density.<>
DIII-D高级导流器中的颗粒控制
在DIII-D下部外部转流器位置安装并操作了一种新型的、可电偏置的半封闭转流器。半封闭导流器在抽气腔内产生了超过10mtorr的静态气体压力累积。电偏压通过E*B漂移控制粒子在内外分流器之间的循环分布。根据不同的标志,偏置会增加或减少充气压力。偏置大大降低了充气压力对分离柱位置的敏感性。特别是,DIII-D几何结构中的E*B漂移可以引导等离子体穿过分流器目标,然后最佳地进入泵浦孔径。即使没有主动泵浦,偏置也证明了对ELMing h模等离子体密度的有限控制。
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