Gas cleaning with semi-wet type plasma reactor

Conference Record of the 1993 IEEE Industry Applications Conference Twenty-Eighth IAS Annual Meeting Pub Date : 1993-10-02 DOI:10.1109/IAS.1993.299134

A. Chakrabarti, A. Mizuno, K. Shimizu, T. Matsuoka, S. Furuta

{"title":"Gas cleaning with semi-wet type plasma reactor","authors":"A. Chakrabarti, A. Mizuno, K. Shimizu, T. Matsuoka, S. Furuta","doi":"10.1109/IAS.1993.299134","DOIUrl":null,"url":null,"abstract":"An experimental study on the removal of NH/sub 3/, NO, and NO/sub x/ in concentrations of 10-40 ppm in air has been carried out using plasma chemical reaction in a streamer corona discharge. The results of the performance of dry-type and semi-wet-type reactors are compared. The effect of different types of applied voltages such as rectangular pulse, 60 Hz sinusoidal, and 18 kHz alternating voltages is investigated. During NO removal, O/sub 3/ and NO/sub 2/ are produced. NO/sub 2/ can, partially, be removed with higher power input into the discharge. Another undesirable pollutant, namely N/sub 2/O, is also produced, especially in the case of dry reactors having long residence time ( approximately 2.4 s). N/sub 2/O production decreases, essentially, to zero at 0.6 s residence time when using a semiwet reactor. In general, higher removal efficiency has been obtained with pulse voltage in a wet reactor. NH/sub 3/ in air appears to produce ozone and ammonium nitrate in a discharge. The performance of semiwet reactors with regard to the removal of submicron dust particles has also been investigated and very high removal efficiency ( approximately 93% at 0.6 s residence time) has been obtained.<<ETX>>","PeriodicalId":345027,"journal":{"name":"Conference Record of the 1993 IEEE Industry Applications Conference Twenty-Eighth IAS Annual Meeting","volume":"47 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"39","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference Record of the 1993 IEEE Industry Applications Conference Twenty-Eighth IAS Annual Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IAS.1993.299134","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 39

Abstract

An experimental study on the removal of NH/sub 3/, NO, and NO/sub x/ in concentrations of 10-40 ppm in air has been carried out using plasma chemical reaction in a streamer corona discharge. The results of the performance of dry-type and semi-wet-type reactors are compared. The effect of different types of applied voltages such as rectangular pulse, 60 Hz sinusoidal, and 18 kHz alternating voltages is investigated. During NO removal, O/sub 3/ and NO/sub 2/ are produced. NO/sub 2/ can, partially, be removed with higher power input into the discharge. Another undesirable pollutant, namely N/sub 2/O, is also produced, especially in the case of dry reactors having long residence time ( approximately 2.4 s). N/sub 2/O production decreases, essentially, to zero at 0.6 s residence time when using a semiwet reactor. In general, higher removal efficiency has been obtained with pulse voltage in a wet reactor. NH/sub 3/ in air appears to produce ozone and ammonium nitrate in a discharge. The performance of semiwet reactors with regard to the removal of submicron dust particles has also been investigated and very high removal efficiency ( approximately 93% at 0.6 s residence time) has been obtained.<>

查看原文本刊更多论文

半湿式等离子体反应器气体清洗

采用流光电晕放电等离子体化学反应对空气中10 ~ 40ppm浓度的NH/sub - 3/、NO和NO/sub - x/进行了去除实验研究。对干式和半湿式反应器的性能进行了比较。研究了矩形脉冲、60hz正弦波和18khz交流电压等不同外加电压的影响。在去除NO的过程中，会产生O/sub 3/和NO/sub 2/。通过在放电中输入更高的功率，可以部分去除NO/sub 2/。另一种不希望的污染物，即N/sub - 2/O，也会产生，特别是在具有长停留时间(约2.4 s)的干式反应器的情况下。当使用半湿式反应器时，N/sub - 2/O的产生基本上在0.6 s的停留时间降至零。一般来说，在湿式反应器中使用脉冲电压可以获得较高的去除效率。在一次排放中，空气中的NH/sub /似乎会产生臭氧和硝酸铵。半湿反应器在去除亚微米粉尘方面的性能也进行了研究，并获得了非常高的去除效率(在0.6 s的停留时间内约为93%)。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文求助全文

来源期刊

Conference Record of the 1993 IEEE Industry Applications Conference Twenty-Eighth IAS Annual Meeting

自引率

0.00%

发文量