Methods for planar integrated low pass filter performance improvements in high frequency

A. Racasan, C. Munteanu, V. Topa, C. Pacurar, C. Hebedean, Mihaela Cislariu
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Abstract

The improvement of the performances of a filter involves two major research directions: the first one refers to the attenuation increase (through the increase of the losses) at high frequency and the second one refers to the suppression of the parasitic effects from the constitutive devices. In this light, this paper presents the authors contributions in terms of improving the filter performances through the attenuation increase at high frequency considering also the parasitic effects minimization. Thus, in order to increase the attenuation at high frequency the use of nickel platting method on the copper conductors is proposed, method which will be tested on a low-pass filter constructed in planar electromagnetic technology.
改进平面集成低通滤波器高频性能的方法
滤波器性能的提高涉及两个主要的研究方向:第一个是指在高频下(通过增加损耗)衰减的增加,第二个是指抑制来自本构器件的寄生效应。鉴于此,本文介绍了作者在考虑最小化寄生效应的情况下,通过增加高频衰减来提高滤波器性能方面的贡献。为此,提出了在铜导体上镀镍以增加高频衰减的方法,该方法将在平面电磁技术构建的低通滤波器上进行测试。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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