Scalable disordered hyperuniform architectures via nano-imprint lithography of metal oxides for different photonic applications

Abstract

Fabrication and scaling of disordered hyperuniform (dHU) materials remain hampered by the difficulties in controlling the spontaneous phenomena leading to this novel kind of exotic arrangement of objects. In this work, we demonstrate a hybrid top-down/bottom-up approach based on sol-gel dip-coating and nano-imprint lithography for the faithful reproduction of dHU metasurfaces in metal oxides (MOx). Nano- to micro-structures made of silica and titania can be directly printed over several cm2 on glass and on silicon substrates. Firstly, we describe the polymer mold fabrication starting from a hard master obtained via spontaneous solid-state dewetting. Then we address the effective dHU character of the master and of the replica and the role of the initial thickness of the sol-gel layer on the MOx replicas. Finally, these structures will be optimized towards their exploitation in many potential photonic applications like photonic devices (anti-reflection coatings, quantum emitters).